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Press Release -- April 16th, 2012
Source: Huawei
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Huawei Shares Views on Respect, Openness, and Collaboration at USITO Ambassador Roundtable on IPR in China

[Beijing, China, April 16, 2012]: “In order to build a healthy global intellectual property rights (IPR) ecosystem that drives technological and social progress, it is vital that we adopt cooperative and collaborative approaches that respect and protect IPR,” said Mr. Deng Tao, Vice President of Huawei, during his keynote speech at the recent USITO Ambassador Roundtable on IPR in China, held in Beijing from April 11 to 12, 2012.

Mr. Deng also stressed the need for a more open approach to IPR. “We appeal to global organizations, be they governmental bodies, industry associations, or enterprises, to expand their capabilities for IPR collaboration and create viable mechanisms that enable greater IPR access, protection, and paid use. Adopting such approaches will mitigate and help to resolve disputes, while also encouraging innovation and technological progress,” said Mr. Deng.

Huawei respects the IPR of others and also strives to protect its own IPR. Every year, Huawei pays approximately US$300 million in royalties in order to legitimately use the patented technologies of industry peers. Huawei invests an average of 10% of its sales revenues in R&D each year, with the total amounting to over US$15 billion in the past decade. Huawei also adopts open and cooperative approaches to IPR, including paid use of IPR and cross-licensing, to reduce the cost of innovations and contribute to a healthy industry ecosystem. Huawei has entered into dozens of cross-licensing agreements with industry peers and other patent holders.

The annual USITO Ambassador Roundtable on IPR in China is attended by senior level officials in the US and China governments and leaders from U.S. and China industry. This year’s event aimed to deepen US-China bilateral collaboration on improving the IPR environment in China and showcase senior level commitment by US and China governments to improving the IPR environment in China.

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